Bouldin, C.
, Wallace, W.
, Lynn, G.
, Roth, S.
and Wu, W.
(2000),
Thermal Expansion Coefficients of Low-K Dielectric Films From Fourier Analysis of X-Ray Reflectivity, Japanese Journal of Applied Physics, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853677
(Accessed April 19, 2024)
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Thermal Expansion Coefficients of Low-K Dielectric Films From Fourier Analysis of X-Ray Reflectivity
Published
Author(s)
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Citation
Japanese Journal of Applied Physics
Volume
88(2)
Pub Type
Journals
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Keywords
electronic materials, reflectivity, silicon, thin films, thin-films
Citation
Created December 31, 1999, Updated October 12, 2021