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PUBLICATIONS

Development of Certified Reference Materials of Ion-Implanted Dopants in Silicon for Calibration of Secondary Ion Mass Spectrometers

Published

Author(s)

David S. Simons, Robert G. Downing, George P. Lamaze, Richard M. Lindstrom, Robert R. Greenberg, Rick L. Paul, Susannah Schiller, William F. Guthrie

Abstract

Certified reference materials have been developed for calibration of the concentrations of the most common dopants used in silicon semiconductor technology boron, arsenic, and phosphorus. These materials consist of a single dopant species that is introduced into a silicon wafer by ion implantation. The certified dose (atoms/cm2) of the dopant species is used for calibration of dopant concentration measurements with secondary ion mass spectrometers. Certification measurements were carried out by nuclear analytical methods -- neutron depth profiling for boron, instrumental neutron activation analysis for arsenic, and radiochemical neutron activation analysis for phosphorus. SRM 2137 contains a 10B implant with a certified dose of (1.018 x 1015 0.035 x 1015) atoms/cm2; SRM 2134 contains a 75As implant with a certified dose of (7.330 x 1014 0.028 x 1014) atoms/cm2; SRM 2133 contains a 31P implant with a certified dose of (9.58 x 1014 0.16 x 1014) atoms/cm2. Several examples demonstrate the improved inter-laboratory agreement that is achievable in the measurement of unknown dopant concentrations and implanted doses when these reference materials are used for calibration by each laboratory.
Citation
Journal of Vacuum Science and Technology
Pub Type
Journals

Keywords

arsenic, boron, CRM, ion implantation, neutron activation analysis, phosphorus, silicon, SIMS, SRM

Citation

Simons, D. , Downing, R. , Lamaze, G. , Lindstrom, R. , Greenberg, R. , Paul, R. , Schiller, S. and Guthrie, W. (2007), Development of Certified Reference Materials of Ion-Implanted Dopants in Silicon for Calibration of Secondary Ion Mass Spectrometers, Journal of Vacuum Science and Technology (Accessed April 19, 2024)

Created January 1, 2007, Updated February 17, 2017