We report ion energy distributions, relative ion intensities, and absolute total ion current densities at the grounded electrode of an inductively coupled Gaseous Electronics Conference radio-frequency reference cell for discharges generated in pure C4, and in CF4: Ar and CF4:O2:Ar mixtures. Abundant ionic species, including secondary ions such as CO+ and COF+, were observed and their implications are discussed.
Citation: Journal of Vacuum Science and Technology A
Pub Type: Journals
carbon tetrafluoride, CF<sub>4</sub>, cleaning plasmas, etching plasmas, inductively coupled plasmas, ion energy distributions, ion flux