Due to the limitations of modern manufacturing technology, there is no commercial height artifact at the sub-nanometer scale currently available. The single-atom steps on a cleaned silicon (111) surface with a height of 0.314 nm, derived from the lattice constant of silicon, have considerable potential as a AFM calibration artifact at the sub-nanometer range. A metrology AFM developed at NIST, called the calibrated AFM (C-AFM), is used to measure this type of surface. In this paper, the results of six sets of measurements made over a period of five months are presented. The calculation of the step algorithm and the uncertainty of the measurement are introduced and discussed briefly.
Proceedings Title: 1998 International Conference on Characterization and Metrology for ULSI Technology
Conference Dates: April 28, 1998
Conference Location: Gaithersburg, MD
Conference Title: International Conference on Characterization and Metrology for ULSI Technology
Pub Type: Conferences
calibration, SPM Metrology, step height