We demonstrate the use of a standing-wave laser beam to focus chromium atoms as they deposit onto a silicon surface. A permanent array of Cr lines has been fabricated with line width 65 nm, spacing 213 nm, and height 34 nm. The array covers an area of 0.4 mm x 1 mm, and was deposited in approximately 10 minutes. The lines made in this way constitute a proof-of-principle of an entirely new approach to nanostructure fabrication, with potential for extremely small feature size coupled with massive parallelism.
Proceedings Title: Proceedings of SPIE, Volume 2125, Photochemistry and Processing
Issue: No. 3
Conference Dates: January 22-29, 1994
Conference Location: Los Angeles, CA
Conference Title: SPIE, Laser Techniques for Surface Science
Pub Type: Conferences
atom optics, chromium, laser-focused deposition, nanostructures, surface diffusion, surface growth