Bergner, B.
, Germer, T.
and Suleski, T.
(2009),
Effect of Line Width Roughness on Optical Scatterometry Measurements, Metrology, Inspection, and Process Control for Microlithography XXIII, San Jose, CA, US, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=901895
(Accessed April 18, 2024)
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Effect of Line Width Roughness on Optical Scatterometry Measurements
Published
Author(s)
, , Thomas Suleski
Abstract
Line width roughness (LWR) has been identified as a potential source of uncertainty in scatterometry measurements, and characterizing its effect is required to improve the method s accuracy and to make measurements traceable. In this work, we extend previous work by using rigorous coupled wave (RCW) analysis on two-dimensionally periodic structures to examine the effects of LWR. We compare the results with simpler models relying upon a number of effective medium approximations. We find that the effective medium approximations yield an approximate order of magnitude indicator of the effect, but that the quantitative agreement may not be good enough to include in scatterometry models.Proceedings Title
Metrology, Inspection, and Process Control for Microlithography XXIII
Conference Dates
February 23-26, 2009
Conference Location
San Jose, CA, US
Pub Type
Conferences
Download Paper
Keywords
effective medium approximation, line width roughness, scatterometry
Citation
Created April 5, 2009, Updated October 12, 2021