We present the results of a thorough study of wet chemical methods for transferring chemical vapor deposition grown graphene from the metal growth substrate to a device compatible substrate. Based on these results, we have developed a modified RCA clean transfer method which has much better control of both contamination and crack formation and does not degrade the quality of the transferred graphene. Using this transfer method, high device yields, up to 97%, with a narrow device performance metrics distribution were achieved. This demonstration addresses an important step towards large scale graphene-based electronic device applications.
Citation: Nano Letters
Pub Type: Journals
nanoelectronics, graphene, graphene transfer, cleaning, crackless, semiconductor device