In summary, an optimized plasma etching process has been developed and a Teflon ring has been made to minimize the feature size variation effect and eliminate the thick glass edge effect. Large phase type dual-focus zone plate with good etching profile and better than 2% etching depth uniformity was successfully made, which is acceptable for the error tolerance of the ROC measurement.
Proceedings Title: 36th International Conference on Micro and Nano Engineering
Conference Dates: September 19-22, 2010
Conference Location: Genoa, -1
Pub Type: Conferences
reactive ion etching, uniformity, zone plate