A review of the evolution of modeling for accurate dimensional scanning electron microscopy is presented with an emphasis on developments in the Monte Carlo technique for SEM dimensional metrology. The progress of modeling for accurate metrology is discussed through a schematic technology timeline. In addition, a discussion of a future vision for accurate SEM dimensional metrology and the requirements to achieve it are presented.
Pub Type: Journals
SEM, Monte Carlo modeling, Metrology, Accuracy, Critical Dimensions, Electron-solid interactions