McClelland, J.
, Unguris, J.
, Scholten, R.
and Pierce, D.
(1993),
Simple, Compact, High-Purity Cr Evaporator for UHV, Journal of Vacuum Science and Technology A
(Accessed April 17, 2024)
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Simple, Compact, High-Purity Cr Evaporator for UHV
Published
Author(s)
, , ,
Abstract
A simple, compact Cr evaporator is constructed by electroplating Cr metal onto the tip of a W hairpin filament. At 5 cm from the evaporator, deposition rates up to 10 nm min-1 (flux {asymp} 1019 atoms m-2s-1) have been obtained, with total deposition thickness in excess of 400 nm. Auger analyses of thin film deposited in ultrahigh vacuum show impurities below detectability.Citation
Journal of Vacuum Science and Technology A
Volume
11
Issue
5
Pub Type
Journals
Citation
Created September 1, 1993, Updated February 19, 2017