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Nanotechnology

Tools and Instruments

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NanoFab Tool: ABM Mask Contact Aligner

The ABM contact aligner allows users to align patterns on the front or back of a substrate and to print feature sizes down to 800 nm. The tool offers vacuum

NanoFab Tool: ADT 7132 Dicing Saw

The ADT 7132 dicing saw is used to cut multi-device substrates into individual chips. The system can accommodate substrates up to 4 mm thick and supports sizes

NanoFab Tool: AllWin21 Downstream Asher

The AllWin21 Downstream plasma asher uses heat and exposure to downstream oxygen radicals to remove resist and other organic materials. The cassette load system

Photograph of the ASML PAS5500/275D Stepper.

NanoFab Tool: ASML PAS5500/275D Stepper

The ASML PAS 5500/275D is a high throughput i-line stepper. It utilizes 5X reduction and projection capability with step and repeat to transfer photomask

NanoFab Tool: Atomic Layer Deposition

The Oxford FlexAL atomic layer deposition (ALD) system supports plasma and thermal ALD coating processes with precise ultrathin and pinhole free films. The

NanoFab Tool: Bruker Dektak XT Profilometer

The Bruker Dektak XT contact profilometer measures the thin film thickness of patterned features by sensing the deflection of a fine stylus that is raster

NanoFab Tool: Envirco Laminar Hood

The Envirco 1.8 m laminar hood provides soft lithography lab users a clean environment to perform final assembly processes on PDMS samples. The hood is capable

Photograph of the Arradiance Gemstar atomic layer deposition system.

NanoFab Tool: Gemstar Atomic Layer Deposition

The Arradiance Gemstar atomic layer deposition (ALD) system supports thermal ALD coating processes with precise ultrathin and pinhole free films in a compact

NanoFab Tool: Harrick Plasma PDC-32 Plasma Bonder

The Harrick Plasma PDC-32 plasma bonder is used to remove fine particles on user substrates prior to release agent treatment and to modify the surface bonds of

Photograph of the Lattice Gear LatticeAx cleave tool.

NanoFab Tool: Lattice Gear LatticeAx Cleaving Tool

The Lattice Gear LatticeAx cleaving tool is used for highly accurate, manual cleaving of substrates. The system is an indenting and cleaving tool that produces

NanoFab Tool: Microfluidic Test Station

The CorSolutions microfluidic test station consists of a digital microscope, PneuWave pneumatic pump, and microfluidic probes to enable non-destructive, rapid

NanoFab Tool: Microwave Asher

The microwave plasma system is used for photoresist descum/removal and wafer cleaning. The system is equipped with a hand free door opening system for easy

NanoFab Tool: Nikon SMZ1500 Stereo Microscope

The Nikon SMZ1500 is a long working distance stereo microscope that supports both reflected light and transmitted light modes for inspecting substrates and

NanoFab Tool: Olympus SZH10 Stereo Microscope

The Olympus SZH10 is a long working distance stereo microscope that supports both reflected light and transmitted light modes for inspecting substrates and

NanoFab Tool: PDMS Casting Station

The CNST NanoFab PDMS casting station consists of a Hamilton Safeaire fume hood which houses a Smart Coater 100 spinner, a Dataplate digital hot plate, an Ohaus

Photograph of the Reynolds RCA wet bench

NanoFab Tool: RCA Wet Bench B102

The Reynolds RCA wet bench is used to remove organic and metal contamination from the surfaces of substrates prior to high temperature furnace processing. The

Photograph of the Unaxis 790 reactive ion etcher.

NanoFab Tool: Reactive Ion Etcher Unaxis 790 Right

The Unaxis 790 reactive ion etcher (RIE) is a general purpose parallel plate plasma etching system which uses ionized fluorocarbon gases and oxygen to etch

NanoFab Tool: Reactive Ion Etcher 790 Nitride Left

This PlasmaTherm 790 reactive ion etcher (RIE) is a parallel plate plasma etching system which uses fluorocarbon and oxygen gases to etch silicon nitride thin

NanoFab Tool: Reynolds RCA Wet Bench

The Reynolds RCA wet bench is used to remove organic and metal contamination from the surfaces of substrates prior to processing in high temperature furnaces

Photograph of the Reynolds Tech silicon etch wet bench.

NanoFab Tool: Reynolds Tech Silicon Etch Wet Bench

The Reynolds Tech silicon etch wet bench uses dilute potassium hydroxide (KOH) to preferentially etch silicon along the material's crystal planes. The process

$Photograph of the Rigaku SmartLab X-Ray Diffraction System.$

NanoFab Tool: Rigaku SmartLab X-Ray Diffraction

The Rigaku SmartLab X-ray diffraction system (XRD) is a fully automated, modular system for advanced x-ray diffraction measurements on a wide range of materials

Photograph of the Semitool PSC-101 double stack spin rinse dryer.

NanoFab Tool: Semitool PSC-101 Spin Rinse Dryer

The Semitool PSC-101 spin rinse dryer uses deionized water to rinse and heated nitrogen to dry whole wafer substrates automatically after wet chemical processes

NanoFab Tool: Thermal Thin-Al Evaporator

The Denton “Bench Top Turbo” thermal evaporator is a single source evaporator equipped with substrate rotation, a thickness monitor, and automatic deposition

Photograph of the Tousimis Autosamdri-815 Series B critical point dryer.

NanoFab Tool: Tousimis Autosamdri-815 Series B

The Tousimis Supercritical Autosamdri-815 Series B critical point dryer utilizes liquid carbon dioxide (LCO 2) to dry substrates in a controlled manner in order

NanoFab Tool: Suss MicroTec SB6e Wafer Bonder

The Suss MicroTec SB6e wafer bonder is a universal vacuum substrate bonder for designed for a wide range of microelectromechanical system (MEMS) applications