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Tools and Instruments

Topic Area
Displaying 251 - 275 of 395
Photograph of the Reynolds RCA wet bench

NanoFab Tool: RCA Wet Bench B102

The Reynolds RCA wet bench is used to remove organic and metal contamination from the surfaces of substrates prior to high temperature furnace processing. The
Photograph of the Reynolds RCA wet bench.

NanoFab Tool: Reynolds RCA Wet Bench

The Reynolds RCA wet bench is used to remove organic and metal contamination from the surfaces of substrates prior to processing in high temperature furnaces
Sandvik Anneal Furnaces

NanoFab Tool: Sandvik Anneal Furnaces

The two Sandvik anneal furnaces, equipped with silicon carbide tubes, support anneal processing in the NanoFab. The anneal furnaces allow nitrogen, argon and
Sandvik Anneal Furnaces

NanoFab Tool: Sandvik LPCVD LTO

The Sandvik low pressure chemical vapor deposition (LPCVD) of silicon oxide furnace supports low temperature oxide (LTO) on substrates ranging from small chips
Silanization Oven

NanoFab Tool: Silanization Oven

The Silanization Oven is available to users in the Soft Lithography Laboratory. This tool supports the mold adhesion and release processes using organosilanes
NIF

Neutron Imaging Facility (NIF)

Neutron Imaging, an Essential Tool for the Hydrogen Economy The problem that the NIST Neutron Imaging Facility (NIF) can address that directly impacts the