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NanoFab Tool: Veeco Dimension 3100 Atomic Force Microscope

Photograph of the Veeco Dimension 3100 Atomic Force Microscope.

The Veeco Dimension 3100 atomic force microscope (AFM) provides users the ability to characterize the surface roughness of nanofabricated structures. Conveniently located outside of the cleanroom, it can perform nanomanipulation and nanolithography on substrates ranging from 200 mm diameter wafers down to small pieces.


  • Contact mode, tapping mode, and phase imaging.
  • Electrostatic force microscopy.
  • Magnetic force microscopy.
  • Nanomanipulation and nanolithography.

Usage Information

Supported Sample Sizes

  • Maximum wafer diameter: 200 mm (8 in).
  • Maximum substrate thickness: 12 mm.
  • Small pieces supported: Yes.

Typical Applications

  • Characterization of surface roughness.
  • Pattern characterization for lithography structures, magnetic media, CD/DVDs.
  • Structure characterization of polymers, biomaterials and other samples.
  • Nanomanipulation and nanolithography by using AFM tip.
Created May 19, 2014, Updated November 21, 2019