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NanoFab Tool: Nanometrics Nanospec Reflectometer

Photograph of the Nanometrics Nanospec reflectometer.

The Nanometrics Nanospec reflectometer provides users with a quick film thickness measurement on the most common device film stacks. The Nanospec combines a simple microscope with a reflectance measurement system, allowing point specific film thickness determination on substrates ranging from 150 mm diameter wafers down to small pieces.


  • Film thicknesses from several micrometers down to 10 nm.
  • Standard Films:
    • Oxide on silicon.
    • Nitride on silicon.
    • Polysilicon on oxide on silicon.
    • Photoresist on silicon.

Usage Information

Supported Sample Sizes

  • Maximum wafer diameter: 150 mm (6 in).
  • Small pieces supported: Yes.
  • Maximum thickness: 10 mm.

Typical Applications

  • Thickness verification of deposited or etched films.
  • Process characterization of patterned substrates.
Created May 21, 2014, Updated November 9, 2020