The Nanometrics Nanospec reflectometer provides users with a quick film thickness measurement on the most common device film stacks. The Nanospec combines a simple microscope with a reflectance measurement system, allowing point specific film thickness determination on substrates ranging from 150 mm diameter wafers down to small pieces.
Film thicknesses from several micrometers down to 10 nm.
Oxide on silicon.
Nitride on silicon.
Polysilicon on oxide on silicon.
Photoresist on silicon.
Supported Sample Sizes
Maximum wafer diameter: 150 mm (6 in).
Small pieces supported: Yes.
Maximum thickness: 10 mm.
Thickness verification of deposited or etched films.