NanoFab Tool: JEOL 7800F Field Emission Scanning Electron Microscope
The JEOL 7800F Field Emission Scanning Electron Microscope (FE-SEM) is a high resolution FE-SEM that is capable of imaging the fine structure of materials with sub nanometer resolution. In addition to conventional SEM imaging, it is capable of high resolution, low voltage imaging of nonconducting samples and imaging magnetic materials. Substrates ranging from 200 mm diameter wafers down to small pieces can be imaged with the system. The JEOL 7800F has 4 electron detectors that are optimized for a variety of imaging conditions. The detectors include an energy selective in-lens secondary/backscatter detector for high resolution low and high kV topographic/composition contrast imaging. It also has an off axis, in lens secondary detector, an Everhart Thornley secondary electron detector, and a retractable backscatter electron detector.
Imaging from 10 V to 30 kV
Resolution: 0.8 nm at 15 kV; 1.2 nm at 1 kV.
Magnification: 25 times to 1,000,000 times.
The FESEM has 4 detectors:
In lens secondary detector and Everhart Thornley secondary detector
Energy selective secondary/backscattered electron detector for topography/compositional contrast imaging at low voltages.
Retractable backscatter detector for composition contrast imaging
Aperture Control lens that automatically optimizes the probe current and beam size depending on the imaging conditions.
Beam deceleration mode to reduce charging of non-conducting specimens.
Motorized stage with travel in 5 axes.
Integrated 200 mm airlock for fast sample changes.
Supported Sample Sizes
Maximum wafer diameter: 200 mm (8 in).
Small pieces supported: Yes.
Measurement and inspection of nanometer scale structures.