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New and Upcoming NanoFab Capabilities

The CNST has acquired a range of new tools which will become available to NanoFab users in the coming months.

CMP and Wafer Cleaner – Award Announcement, July 2017

The CNST has purchased a Chemical Mechanical Polisher (CMP) and a post-CMP wafer cleaner from Axus Technology.  The CMP is an IPEC 472T capable of handling wafers from 75 mm to 200 mm in diameter. It is equipped with a primary platen to remove the material and a secondary platen to do the final polish and minimize the surface roughness. The within-wafer non-uniformity is better than 3 % and wafer-to-wafer non-uniformity better than 5 %. The wafer cleaner is a GnP 412S equipped with double-sided PVA brushes and a megasonic agitation in the final rinse water. Delivery of both tools is expected during July of 2017.

For additional information please contact Gerard Henein, 301-975-5645, gerard.henein [at] nist.gov.
 

Profilometer System - Now Available

The CNST has added a second Bruker Dektak XT profilometer with a motorized X-Y-Θ stage, replacing the older Dektak 6M.In addition to providing step height, surface roughness and waviness measurements, the new profilometer offers wafer mapping and 3-D topological imaging. It can handle small samples and wafers up to 200 mm in diameter.

For additional information please contact Gerard Henein, 301-975-5645, gerard.henein [at] nist.gov.


High Resolution Field Emission Scanning Electron Microscope — Now Available

The CNST has purchased a JEOL JSM-7800F FESEM which will be installed in the NanoFab cleanroom in Fall 2016. The JSM-7800F is a research grade, extremely high resolution thermal Schottky type SEM which provides high resolution imaging for any type of sample. It also maintains long-term beam stability for analysis, as well as high beam currents, high resolution, and low kV high resolution imaging. This is a high performance FESEM that can be used to observe the finest structural morphology of nanomaterials at 1,000,000× magnification with better than 1 nm resolution. It has excellent low voltage imaging capability enabling users to image resist coated wafers, quartz wafers and other non-conducting samples without a conductive coating. It will be able to handle wafers up to 200 mm in diameter and obtain images from the entire wafer. The FESEM will be located in the NanoFab cleanroom to allow easy imaging of wafer between process steps as well as imaging routine samples.

For additional information, please contact Kerry Siebein, 301-975-8458, kerry.siebein [at] nist.gov.


Single Wafer Spray Acid System — Now Available

The CNST has purchased three SSEC model 3300ML spray acid cleaning systems to support RCA and Piranha processes in the NanoFab cleanroom. The tools are expected to be installed in Fall 2016. These tools will provide automated single wafer cleaning process without exposing users to chemicals. They will replace the current immersion cleaning process to eliminate cross contamination between wafers, providing better wafer cleaning capability. The three systems can accommodate substrates ranging from 200 mm diameter wafers to small pieces. In addition, the tools are capable of delivering, mixing, and heating chemical solutions on demand.

For additional information, contact Matt Robinson, 301-975-2421, matthew.robinson [at] nist.gov.


Rapid Thermal Annealer — Now Available

The CNST has purchased an AnnealSys AS-Master 2000 HT rapid thermal annealing tool which will be installed in the cleanroom in Fall 2016. The new tool will provide improved annealing performance to users seeking to minimize the thermal budgets in their fabrication processes. An increased range of non-contact temperature control from 150 °C up to 1500 °C and ramp rates as high as 200 °C / s will be available while maintaining uniform heating across substrates ranging from 200 mm diameter wafers down to small pieces. The tool will be ideal for dopant activation while maintaining shallow junctions, thin film annealing, silicide formation, and oxidation.

For additional information please contact Robert Newby, 301-975-6070, robert.newby [at] nist.gov.


Acid Fume Hood — Now Available

The CNST has purchased a new acid wet bench to replace the existing general purpose acid bench in cleanroom which is now available to users. The bench will support three simultaneous users and each position will be equipped with an electronic timer, integrated stirring hot plate, sink, glove rinse, nitrogen gun, aspirator, deionized water spray and work surface capable of handling substrates ranging from 200 mm diameter wafers down to small pieces.

For additional information please contact Liya Yu, 301-975-4590, liya.yu [at] nist.gov.


FEI Helios FIB Upgrades – Now Available

The CNST NanoFab plans to add new capabilities to the Helios 650 DualBeam microscopes including two new types of electron detectors and a multiple gas injection system. The new detectors will allow the capture and differentiation of low-loss and no-loss backscatter electrons (BSE), which are important for discriminating between materials of very similar composition, including composites. The new detectors can be used with the current detectors, enabling simultaneous secondary electron and BSE imaging. The multiple gas injection system adds precise control of gas flow, gas needle location, and gas mixing capabilities to the current direct beam-induced deposition systems.

For additional information please contact Joshua Schumacher, 301-975-8065, joshua.schumacher [at] nist.gov.


Silane Vapor Deposition Tool – Now Available

The CNST NanoFab has purchased a silane vapor deposition tool use in the soft lithography laboratory and should be available to users in January 2017. The silane vapor deposition tool will be capable of depositing a monolayer of silane based chemicals on the surface of a PDMS master to prevent adhesion between the PDMS and the master. This tool is recommended for applications related to thin film casting, high aspect ratio features fabrication and other highly intricate and delicate masters. A dedicated silanization tool will provide safe operation for users and prevent exposure to the hazard material. The tool will support substrates ranging from 150 mm down to small pieces.

For additional information please contact Jessie Zhang, 301-975-4565, chen.zhang [at] nist.gov (.)


PDMS Mixing Tool – Now Available

The CNST NanoFab has purchased a PDMS mixing tool for use in the soft lithography laboratory which is now available to users. The mixer will provide rapid and thorough mixing of the PDMS components with precise speed control thus producing more repeatable films.

For additional information please contact Robert Newby, 301-975-6070, robert.newby [at] nist.gov (.)


PDMS Puncher – Now Available

The CNST NanoFab has purchased a PDMS puncher for use in the soft lithography laboratory which is now available to users. The puncher, when setup together with a microscope will provide precise arrays of holes in PDMS films for multilayer microfluidics device development and fabrication.

For additional information please contact Robert Newby, 301-975-6070, robert.newby [at] nist.gov (.)


Acid and Solvent Wet Benches – Now Available

The CNST has purchased new acid and solvent wet benches which will replace the existing general purpose benches in the cleanroom. Each new bench will support three simultaneous users equipped with an electronic timer, integrated stirring hot plate, sink, glove rinse, nitrogen gun, aspirator, deionized water spray and work surface capable of handling substrates ranging from 200 mm diameter wafers down to small pieces.

For additional information please contact Liya Yu, 301-975-4590, liya.yu [at] nist.gov.


 

Created December 26, 2013, Updated April 10, 2017