Location: Bldg. 215, Rm. D101
The NanoFab provides researchers from industry, academia, NIST, and other government agencies rapid access to a comprehensive suite of tools and processes for nanofabrication and measurement. This world-class facility is a unique national resource, combining easy access, tool and process development, and training, while providing researchers from across the nation access to NIST-wide expertise in nanoscience and nanotechnology. The facility is accessible through a simple application process designed to get users into the facility in a few weeks. The NanoFab has over 5,600 square meters (60,000 square foot) of laboratory space, including a 1,800 square meter (8,000 square foot) cleanroom, with 750 square meters (8,000 square feet) at Class 100, along with additional high-performance laboratories nearby. There are over 90 fabrication and processing tools in the cleanroom, including tools for electron beam-, photo- and nanoimprint-lithography, laser writing and mask generation, field emission scanning electron microscopy, metal deposition, plasma etching, chemical vapor deposition, atomic layer deposition, and silicon micro/nano-machining. Tools outside the cleanroom include a second electron beam lithography system, a second atomic force microscope, a dual beam focused ion beam system and a transmission electron microscope.