TY  - CONF
AU  - Vivek Prabhu
AU  - M Wang
AU  - E Jablonski
AU  - B Vogt
AU  - Eric Lin
AU  - Wen-Li Wu
AU  - D Goldfarb
AU  - M Angelopoulos
AU  - H Ito
C2  - Proceedings of SPIE, Santa Clara, CA
DA  - 2004-05-01
LA  - en
M1  - 5376
PB  - Proceedings of SPIE, Santa Clara, CA
PY  - 2004
TI  - Fundamentals of Developer-Resist Interactions for Line-Edge Roughness and Critical Dimension Control in Model 248 nm and 157 nm Photoresists
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852336
ER  -