TY  - CONF
AU  - Ndubuisi George Orji
C2  - Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (Conference 11611), Virtual, MD, US
DA  - 2021-04-01 04:04:00
DO  - https://doi.org/10.1117/12.2584649
LA  - en
M1  - 11611
PB  - Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (Conference 11611), Virtual, MD, US
PY  - 2021
TI  - Spectral Analysis of Line Edge and Line Width Roughness using Wavelets
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=932010
ER  -