TY  - CONF
AU  - Christopher Evans
AU  - R Parks
AU  - L Shao
AU  - Tony Schmitz
AU  - Angela Davies
C2  - Metrology, Inspection and Process Control for Microlithography, Conference | 15th | Metrology, Inspection and Process Control for Microlithography XV | SPIE
DA  - 2001-08-01
LA  - en
M1  - 4344
PB  - Metrology, Inspection and Process Control for Microlithography, Conference | 15th | Metrology, Inspection and Process Control for Microlithography XV | SPIE
PY  - 2001
TI  - Interferometric Testing of Photomask Substrate Flatness
ER  -