TY - JOUR AU - Hae-Jeong Lee AU - Eric Lin AU - J Lan AU - Y Cheng AU - H Liou AU - Wen-Li Wu AU - Y Wang AU - M Feng AU - C Chao C2 - Characterization and Metrology for ULSI Technology Conference DA - 2008-10-16 14:10:19 LA - en PB - Characterization and Metrology for ULSI Technology Conference PY - 2008 TI - Investigation of N2 Plasma Effects on the Depth Profile of Hydrogen Silsesquioxane Thin Films Using High Resolution Specular X-Ray Reflectivity ER -