TY  - CONF
AU  - Mark-Alexander Henn
AU  - Bryan Barnes
AU  - Hui Zhou
C2  - SPIE Advanced Lithography 2017, San Jose, CA, US
DA  - 2017-03-29 04:03:00
DO  - https://doi.org/10.1117/12.2262544
LA  - en
M1  - 10145
PB  - SPIE Advanced Lithography 2017, San Jose, CA, US
PY  - 2017
TI  - Evaluating the Effects of Modeling Errors for Isolated Finite3-D Targets
ER  -