TY  - JOUR
AU  - T Gougousi
AU  - Y Xu
AU  - J Kidder
AU  - G Rubloff
AU  - Charles Tilford
C2  - Journal of Vacuum Science and Technology B
DA  - 2000-05-01 00:05:00
LA  - en
M1  - 18
PB  - Journal of Vacuum Science and Technology B
PY  - 2000
TI  - Process Diagnostics and Thickness Metrology Using in Situ Mass Spectrometry for the Chemical Vapor Deposition of W from H<sub>2</sub>/WF<sub>6</sub>
ER  -