TY  - CONF
AU  - J Pedulla
AU  - James Potzick
AU  - Richard Silver
C2  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XVIII, Richard M. Silver, Editor, Santa Clara, CA, USA
DA  - 2004-05-01 00:05:00
LA  - en
M1  - 5375
PB  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XVIII, Richard M. Silver, Editor, Santa Clara, CA, USA
PY  - 2004
TI  - Improving the Uncertainty of Photomask Linewidth Measurements
ER  -