TY  - CONF
AU  - Crossley Jayewardene
AU  - William Keery
AU  - Michael Postek
AU  - Andras Vladar
AU  - Bradley Damazo
C2  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XVI, Daniel J. C. Herr, Editor, Santa Clara, CA, USA
DA  - 2002-06-01 00:06:00
LA  - en
M1  - 4689
PB  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XVI, Daniel J. C. Herr, Editor, Santa Clara, CA, USA
PY  - 2002
TI  - Design and Development of a Measurement and Control System for Measuring SEM Magnification Calibration Samples
ER  -