TY  - CONF
AU  - Ronald Jones
AU  - T Hu
AU  - Eric Lin
AU  - Wen-Li Wu
AU  - D Casa
AU  - Ndubuisi Orji
AU  - Theodore Vorburger
AU  - P Bolton
AU  - Z Barclay
C2  - Metrology, Inspection and Process Control for Microlithography | 17th | Metrology, Inspection and Process Control for Microlithography XVII | SPIE, Undefined
DA  - 2003-06-01 00:06:00
LA  - en
M1  - 5038
PB  - Metrology, Inspection and Process Control for Microlithography | 17th | Metrology, Inspection and Process Control for Microlithography XVII | SPIE, Undefined
PY  - 2003
TI  - Sub-Nanometer Wavelength Metrology of Lithographically Prepared Structures: A Comparison of Neutron and X-Ray Scattering
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852192
ER  -