TY  - JOUR
AU  - K Ohmori
AU  - P Ahmet
AU  - M Yoshitake
AU  - T Chikyow
AU  - K Shiraishi
AU  - K Yamabe
AU  - H Watanabe
AU  - Y Akasaka
AU  - Kao-Shuo Chang
AU  - Martin Green
AU  - K Yamada
C2  - Journal of Applied Physics
DA  - 2007-08-13 00:08:00
LA  - en
M1  - 101
PB  - Journal of Applied Physics
PY  - 2007
TI  - Instability of Flatband Voltage in HfO2 Gate Stack Structures under Reducing/Oxidizing Annealing Conditions
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=851023
ER  -