TY  - CONF
AU  - Ashwin Rao
AU  - Shuhui Kang
AU  - B Vogt
AU  - Vivek Prabhu
AU  - Eric Lin
AU  - Wen-Li Wu
AU  - Karen Turnquest
AU  - W Hinsberg
C2  - Proceedings of SPIE, San Jose, CA, US
DA  - 2006-02-19 00:02:00
LA  - en
M1  - 6153
PB  - Proceedings of SPIE, San Jose, CA, US
PY  - 2006
TI  - Dissolution Fundamentals of 193-nm Methacrylate Based Photoresists
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852551
ER  -