TY  - CONF
AU  - Kwang-Woo Choi
AU  - Vivek Prabhu
AU  - Kristopher Lavery
AU  - Eric Lin
AU  - Wen-Li Wu
AU  - John Woodward IV
AU  - Michael Leeson
AU  - H Cao
AU  - Manish Chandhok
AU  - George Thompson
C2  - Proceedings of SPIE, San Jose, CA, US
DA  - 2007-02-25 00:02:00
LA  - en
M1  - 6519
PB  - Proceedings of SPIE, San Jose, CA, US
PY  - 2007
TI  - Effect of Photoacid Generator Concentration and Developer Strength on the Patterning Capabilities of a Model EUV Photoresist
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852725
ER  -