TY  - CONF
AU  - Paul Lemaillet
AU  - Thomas Germer
AU  - Regis Kline
AU  - Daniel Sunday
AU  - Chengqing Wang
AU  - Wen-Li Wu
C2  - Metrology, Inspection, and Process Control for Microlithography XXVII, San Jose, CA, US
DA  - 2013-04-08 00:04:00
LA  - en
PB  - Metrology, Inspection, and Process Control for Microlithography XXVII, San Jose, CA, US
PY  - 2013
TI  - Intercomparison between optical and x-ray scatterometry measurements of FinFET structures
ER  -