TY  - CONF
AU  - Brent Bergner
AU  - Thomas Germer
AU  - Thomas Suleski
C2  - Metrology, Inspection, and Process Control for Microlithography XXIII, San Jose, CA, US
DA  - 2009-04-06 00:04:00
LA  - en
PB  - Metrology, Inspection, and Process Control for Microlithography XXIII, San Jose, CA, US
PY  - 2009
TI  - Effect of Line Width Roughness on Optical Scatterometry Measurements
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=901895
ER  -