TY  - JOUR
AU  - Houxun Miao
AU  - Lei Chen
AU  - Mona Mirzaeimoghri
AU  - Richard Kasica
AU  - Han Wen
C2  - Journal of Microelectromechanical Systems
DA  - 2016-07-29 00:07:00
DO  - https://doi.org/10.1109/JMEMS.2016.2593339
LA  - en
PB  - Journal of Microelectromechanical Systems
PY  - 2016
TI  - Cryogenic Etching of High Aspect Ratio 400 nm Pitch Silicon Gratings
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=918475
ER  -