TY  - JOUR
AU  - N Materer
AU  - R Goodman
AU  - S Leone
C2  - Journal of Physical Chemistry B
DA  - 2000-04-01 00:04:00
LA  - en
M1  - 104
PB  - Journal of Physical Chemistry B
PY  - 2000
TI  - Ion-Enhanced Etching of Si(100) With Molecular Chlorine: Neutral and Ionic Product Yields as a Function of Ion Kinetic Energy and Molecular Chlorine Flux
ER  -