TY  - CONF
AU  - J Pedulla
AU  - James Potzick
AU  - Michael Stocker
C2  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XVII, Daniel J. Herr, Editor, Santa Clara, CA, USA
DA  - 2003-05-01 00:05:00
LA  - en
M1  - 5038
PB  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XVII, Daniel J. Herr, Editor, Santa Clara, CA, USA
PY  - 2003
TI  - Updated NIST Photomask Linewidth Standard
ER  -