TY - VIDEO
AU - Nicoletti, A
AU - Srinivasan, P
AU - Riva, M
AU - Benck, Eric
AU - Goyette, A
AU - Wang, Ying-Ju
AU - Kim, J
AU - Hsieh, P
AU - Athayde, A
AU - Joshi, Abhay
C2 - International Symp Plasma Chemistry
DA - 2003-01-01 00:01:00
LA - en
PB - International Symp Plasma Chemistry
PY - 2003
TI - C4F6 - 1,3 Hexafluorobutadiene - A New Etching Gas: Studies on Material Compatibility, Behavior in an Inductively Coupled Plasma and Etch Process Performance
ER -