TY  - JOUR
AU  - R Goodman
AU  - N Materer
AU  - S Leone
C2  - Journal of Vacuum Science and Technology
DA  - 1999-12-01 00:12:00
LA  - en
M1  - 17
PB  - Journal of Vacuum Science and Technology
PY  - 1999
TI  - Ion-Enhanced Etching of Si(100) With Molecular Chlorine: Reaction Mechanisms and Product Yields
ER  -