TY  - CONF
AU  - A Nicoletti
AU  - P Srinivasan
AU  - M Riva
AU  - Eric Benck
AU  - A Goyette
AU  - Yicheng Wang
AU  - J Kim
AU  - P Hsieh
AU  - A Athayde
AU  - Abhay Joshi
C2  - 16th International Symposium on Plasma Chemistry, Taormina, 1, IT
DA  - 2003-06-01 00:06:00
LA  - en
PB  - 16th International Symposium on Plasma Chemistry, Taormina, 1, IT
PY  - 2003
TI  - C<sub>4</sub>F<sub>6</sub> 1,3 Hexafluorobutadiene - A New Etching Gas: Studies on Material Compatibility, Behavior in Inductively Coupled Plasma and Etch Processes Performance
ER  -