TY  - CONF
AU  - Nicoletti, A
AU  - Srinivasan, P
AU  - Riva, M
AU  - Benck, Eric
AU  - Goyette, A
AU  - Wang, Yicheng
AU  - Kim, J
AU  - Hsieh, P
AU  - Athayde, A
AU  - Joshi, Abhay
C2  - 16th International Symposium on Plasma Chemistry, Taormina, 1, IT
DA  - 2003-06-01 00:06:00
LA  - en
PB  - 16th International Symposium on Plasma Chemistry, Taormina, 1, IT
PY  - 2003
TI  - C<sub>4</sub>F<sub>6</sub> 1,3 Hexafluorobutadiene - A New Etching Gas: Studies on Material Compatibility, Behavior in Inductively Coupled Plasma and Etch Processes Performance
ER  -