TY  - CONF
AU  - V. Lee
AU  - Eric Lin
AU  - J Lan
AU  - Y Cheng
AU  - H Liou
AU  - Wen-Li Wu
AU  - Y Wang
AU  - M Feng
AU  - C Chao
C2  - Characterization and Metrology for ULSI Technology: 2000 International Conference,  Gaithersburg, MD
DA  - 2000-01-01 00:01:00
LA  - en
PB  - Characterization and Metrology for ULSI Technology: 2000 International Conference,  Gaithersburg, MD
PY  - 2000
TI  - Investigation of N2 Plasma Effects on the Depth Profile of Hydrogen Silsesquioxane Thin Films Using High Resolution Specular X-Ray Reflectivity
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853664
ER  -