TY  - CONF
AU  - Robert Geer
AU  - D. Wu
AU  - David Wollman
C2  - Proc., IEEE 2001 International (Interconnect Tech. Conf.), Burlingame, CA
DA  - 2001-12-31 00:12:00
LA  - en
PB  - Proc., IEEE 2001 International (Interconnect Tech. Conf.), Burlingame, CA
PY  - 2001
TI  - High-resolution EDS Analysis of Ultra-Thin TaSiN Diffusion Barriers for Cu Metallization using Microcalorimetry
ER  -