TY  - JOUR
AU  - Hao Xiong
AU  - Dawei Heh
AU  - Moshe Gurfinkel
AU  - Qiliang Li
AU  - Yoram Shapira
AU  - Curt Richter
AU  - Gennadi Bersuker
AU  - Choi Rino
AU  - John Suehle
C2  - Materials Science and Engineering A-Structural Materials Properties Microstructure and Processing
DA  - 2007-09-30 00:09:00
LA  - en
M1  - 84
PB  - Materials Science and Engineering A-Structural Materials Properties Microstructure and Processing
PY  - 2007
TI  - Characterization of Electrically Active Defects in High-K Gate Dielectrics By Using Low Frequency Noise, Charge Pumping, and Fast Id-Vg measurements
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=32633
ER  -