TY  - JOUR
AU  - Michael Postek
AU  - J Lowney
AU  - Andras Vladar
AU  - William Keery
AU  - Egon Marx
AU  - Robert Larrabee
C2  - Scanning
DA  - 1994-01-01 00:01:00
LA  - en
M1  - 16, Supp. IV
PB  - Scanning
PY  - 1994
TI  - Electron Beam Interaction Modeling as Applied to X-Ray Lithography Mask SEM Linewidth Metrology
ER  -