TY  - CONF
AU  - Nien Zhang
AU  - Michael Postek
AU  - Robert Larrabee
AU  - L Carroll
AU  - William Keery
C2  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography X, Susan K. Jones, Editor, Santa Clara, CA, USA
DA  - 1996-05-01 00:05:00
LA  - en
M1  - 2725
PB  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography X, Susan K. Jones, Editor, Santa Clara, CA, USA
PY  - 1996
TI  - New Algorithm for the Measurement of Pitch in Metrology Instruments
ER  -