TY - CONF AU - J Lowney AU - Andras Vladar AU - Michael Postek C2 - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography X, Susan K. Jones, Editor, Santa Clara, CA, USA DA - 1996-05-01 00:05:00 LA - en M1 - 2725 PB - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography X, Susan K. Jones, Editor, Santa Clara, CA, USA PY - 1996 TI - High-Accuracy Critical-Dimension Metrology Using a Scanning Electron Microscope ER -