TY  - CONF
AU  - Thomas Germer
C2  - Metrology, Inspection, and Process Control for Microlithography | XXI | 2007 |
DA  - 2007-05-07
LA  - en
PB  - Metrology, Inspection, and Process Control for Microlithography | XXI | 2007 |
PY  - 2007
TI  - Modeling the Effect of Line Profile Variation on Optical Critical Dimension Metrology
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=841071
ER  -