TY  - CONF
AU  - Thomas Germer
AU  - Egon Marx
C2  - Metrology, Inspection, and Process Control for Microlithography | 20th |   | SPIE
DA  - 2006-07-03
LA  - en
PB  - Metrology, Inspection, and Process Control for Microlithography | 20th |   | SPIE
PY  - 2006
TI  - Simulations of Optical Microscope Images
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=841006
ER  -