TY  - JOUR
AU  - Lei Chen
AU  - Vincent Luciani
AU  - Houxun Miao
C2  - Microelectronic Engineering
DA  - 2011-08-01
LA  - en
M1  - 88
PB  - Microelectronic Engineering
PY  - 2011
TI  - Effect of Alternating Ar and SF6/C4F8 Gas Flow in Si Nano-Structure Plasma Etching
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=906648
ER  -