TY  - JOUR
AU  - Mark Sobolewski
C2  - Journal of Vacuum Science and Technology A
DA  - 2006-09-01
LA  - en
M1  - 25
PB  - Journal of Vacuum Science and Technology A
PY  - 2006
TI  - Real-Time, Noninvasive Monitoring of Ion Energy and Ion Current at a Wafer Surface During Plasma Etching
ER  -