TY  - CONF
AU  - Steven Grantham
AU  - Charles Tarrio
AU  - Shannon Hill
AU  - Lee Richter
AU  - J. van
AU  - C. Kaya
AU  - N. Harned
AU  - R. Hoefnagels
AU  - M. Silova
AU  - J. Steinhoff
C2  - EUV Lithography 2011, San Jose, CA
DA  - 2011-08-29
LA  - en
M1  - 7969
PB  - EUV Lithography 2011, San Jose, CA
PY  - 2011
TI  - The NIST EUV facility for advanced photoresist qualification using the witness-sample test
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=908029
ER  -