TY  - CONF
AU  - Richard Quintanilha
AU  - Martin Sohn
AU  - Bryan Barnes
AU  - Richard Silver
C2  - Proceeding of SPIE Metrology, Inspection,and Process Control for Microlithography XXIV, San Jose, CA
DA  - 2010-04-01
LA  - en
M1  - 76381
PB  - Proceeding of SPIE Metrology, Inspection,and Process Control for Microlithography XXIV, San Jose, CA
PY  - 2010
TI  - Sub-50 nm measurements using a 193 nm angle-resolved scatterfield microscope
ER  -