TY  - CONF
AU  - Ravikiran Attota
AU  - Richard Silver
AU  - Bryan Barnes
C2  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XXII, John Allgair, Editor, San Jose, CA
DA  - 2008-04-16
LA  - en
M1  - 6922
PB  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XXII, John Allgair, Editor, San Jose, CA
PY  - 2008
TI  - Optical Through-Focus Technique that Differentiates Small Changes in Line Width, Line Height and Sidewall Angle for CD, Overlay, and Defect Metrology Applications
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=824634
ER  -